VACUUM ULTRAVIOLET LIGHT EMITTING ELEMENT

PROBLEM TO BE SOLVED: To provide a new vacuum ultraviolet light emitting element which emits light with high brightness in a vacuum ultraviolet region, and is suitably used, e.g. for photolithography, the cleaning and sterilization of semiconductors and liquid crystals, next-generation mass optical...

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Bibliographische Detailangaben
Hauptverfasser:	YOSHIKAWA AKIRA, ISHIZU SUMUTO, FUKUDA KENTARO, KAWAGUCHI NORIAKI, SUYAMA TOSHIHISA, YANAGIDA TAKEYUKI, YOKOTA ARITAME
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a new vacuum ultraviolet light emitting element which emits light with high brightness in a vacuum ultraviolet region, and is suitably used, e.g. for photolithography, the cleaning and sterilization of semiconductors and liquid crystals, next-generation mass optical disks and medical treatment (ophthalmology treatment and DNA incision).SOLUTION: The vacuum ultraviolet light emitting element is composed of metal fluoride crystals expressed by chemical formula: LiLuTmF, wherein, x is in the range of 0.0001 to 1, more preferably, of 0.005 to 0.1.