LIQUID TREATMENT APPARATUS, LIQUID TREATMENT METHOD, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To suppress drop of a treatment liquid to a substrate from a treatment liquid nozzle for preventing the reduction of the yield, in a liquid treatment apparatus which includes multiple liquid treatment parts arranged in a line in a horizontal direction and each having a substrat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OTO TAKESHI, YONETANI YASUYUKI, SEKIMOTO EIICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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