LIQUID TREATMENT APPARATUS, LIQUID TREATMENT METHOD, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To suppress drop of a treatment liquid to a substrate from a treatment liquid nozzle for preventing the reduction of the yield, in a liquid treatment apparatus which includes multiple liquid treatment parts arranged in a line in a horizontal direction and each having a substrat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OTO TAKESHI, YONETANI YASUYUKI, SEKIMOTO EIICHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To suppress drop of a treatment liquid to a substrate from a treatment liquid nozzle for preventing the reduction of the yield, in a liquid treatment apparatus which includes multiple liquid treatment parts arranged in a line in a horizontal direction and each having a substrate holder, and treatment liquid nozzles shared by the liquid treatment parts.SOLUTION: The liquid treatment apparatus includes: flexible treatment liquid passage members which are connected to the treatment liquid nozzles, respectively; a fixing part which is provided so as to allow the downstream side of each treatment liquid passage member to move to follow the movement of a support drive mechanism while fixing the position of the upstream side of each treatment liquid passage member with respect to the liquid treatment parts not to allow the upstream side of each treatment liquid passage member to move to follow the movement of the support drive mechanism; a vibration sensor which is provided on the upstream side, relative to the fixing part, of the treatment liquid passage members and detects vibrations of the treatment liquid passage members; and a means for handling dripping from the treatment liquid nozzles and drop of the treatment liquid on the basis of detection signals from the vibration sensor.