PHOTOSENSITIVE PASTE COMPOSITION AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is inexpensive and capable of forming a thinnly-filmed and high-definition pattern having a low resistance value on a glass substrate.SOLUTION: The photosensitive paste composition comprises a conductive component (A), an alka...

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Bibliographische Detailangaben
Hauptverfasser:	OKABE SHOGO, MAJIMA HIROSHI, ONIMARU NAMI, MOCHIZUKI DAIGO, UEDA MASAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CABLES CINEMATOGRAPHY CONDUCTORS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INSULATORS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is inexpensive and capable of forming a thinnly-filmed and high-definition pattern having a low resistance value on a glass substrate.SOLUTION: The photosensitive paste composition comprises a conductive component (A), an alkali-soluble resin (C), a polyfunctional (meth)acrylate (D), a photopolymerization initiator (E), and silicon particles (F).