LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE BY USING THE LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE BY USING THE LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate...

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Bibliographische Detailangaben
Hauptverfasser: DANNY MARIA HUBERTUS PHILIPS, RIEPEN MICHEL, CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN, MAIKEL ADRIANUS CORNELIS SCHEPERS, DIREKS DANIEL JOSEPH MARIA, KEMPER NICOLAAS R
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate supported by a table; a liquid handling system configured to supply and confine the immersion liquid to a space defined between a projection system and the table or a substrate, or both of them; and a controller to control a moving speed of the table relative to liquid handling on the basis of a distance between moving direction switches.