GAS HEATING APPARATUS

PROBLEM TO BE SOLVED: To solve the problem that a fluid heating apparatus for producing a high temperature gas with a short flow path in a short period of time is required when applying a heating treatment such as high temperature annealing of a film onto a substrate while keeping the moving substrate to a fixed temperature, or when depositing a thermal CVD film on the surface of the substrate.SOLUTION: The gas is divided into a plurality of small streams and made beam-like by narrowing divided flow paths to accelerate the flow rate. A container wall is arranged at the front so that the beam like gas stream hits the heated container wall at a right angle. The gas streams joined into one again is divided again into many small streams and heat-changed with the container wall. A structure in which this step is repeated plurality of times is simply made on two surfaces of a heated plate by thrusting plates on both surfaces to form flow paths on both surfaces of the plate.