DIFFRACTION ELEMENT, METHOD FOR MANUFACTURING THE DIFFRACTION ELEMENT, AND SPECTROMETER USING THE SAME

PROBLEM TO BE SOLVED: To obtain a highly accurate diffraction element that prevents an intensity decrease of a light beam entering a light receiving unit without a decrease in diffraction efficiency and without a problem of flare or the like, a method of manufacturing the diffraction element, and a...

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Bibliographische Detailangaben
1. Verfasser:	ISHIBE YOSHIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	COLORIMETRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS RADIATION PYROMETRY TESTING
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Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a highly accurate diffraction element that prevents an intensity decrease of a light beam entering a light receiving unit without a decrease in diffraction efficiency and without a problem of flare or the like, a method of manufacturing the diffraction element, and a spectrometer using the same. SOLUTION: In the diffraction element 2 having a diffraction grating formed on a substrate having a curved surface, the curved surface 3 has an anamorphic shape formed by turning a curved line (I) in a plane about a straight line (II) in the same plane serving as a rotating axis, and gratings 10a of the diffraction grating 10 exist in cross sections orthogonal to the rotation axis. COPYRIGHT: (C)2011,JPO&INPIT