CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a photoresist material exhibiting high sensitivity and high resolution. SOLUTION: A cyclic compound is represented by formula (I). In the formula, R is a cyclic alkoxycarbonylalkoxycarbonyl group or the like and R1is a cyclic alkoxycarbonylalkoxy group or the like. C...

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Bibliographische Detailangaben
Hauptverfasser:	KASHIWAMURA TAKASHI, YOMOGIDA TOMOYUKI, OWADA TAKANORI, SHIOYA HIDEAKI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photoresist material exhibiting high sensitivity and high resolution. SOLUTION: A cyclic compound is represented by formula (I). In the formula, R is a cyclic alkoxycarbonylalkoxycarbonyl group or the like and R1is a cyclic alkoxycarbonylalkoxy group or the like. COPYRIGHT: (C)2011,JPO&INPIT