EXPOSURE DEVICE AND METHOD OF MANUFACTURING THE DEVICE

PROBLEM TO BE SOLVED: To provide an exposure device which is advantageous in terms of throughput in case of, for example, an alignment measurement error. SOLUTION: The exposure device which has a stage holding a substrate and moving, lights up an alignment mark formed on the substrate held on the st...

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Bibliographische Detailangaben
1. Verfasser:	FURUTA KAZUNORI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure device which is advantageous in terms of throughput in case of, for example, an alignment measurement error. SOLUTION: The exposure device which has a stage holding a substrate and moving, lights up an alignment mark formed on the substrate held on the stage to measure its position, and positions the substrate based upon the measured position to expose the substrate includes a control means for previously setting a plurality of lighting conditions for the alignment mark, and changing a first lighting condition among the plurality of lighting conditions into a second lighting condition among the plurality of lighting conditions in response to the occurrence of an alignment measurement error under the first lighting condition. COPYRIGHT: (C)2011,JPO&INPIT