IMPLEMENT FOR WASHING SUBSTRATE

PROBLEM TO BE SOLVED: To secure satisfactory washing quality irrespective of a distance from the rotation center while permitting washing of both surfaces of substrate when performing rotation type washing of the substrate on which electronic parts are mounted by using an implement for washing the s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SAGAWA HARUHIDE, OTANI YUJI, TERUI KENICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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