IMPLEMENT FOR WASHING SUBSTRATE

PROBLEM TO BE SOLVED: To secure satisfactory washing quality irrespective of a distance from the rotation center while permitting washing of both surfaces of substrate when performing rotation type washing of the substrate on which electronic parts are mounted by using an implement for washing the substrate. SOLUTION: The implement for washing the substrate is provided with a frame 10 having opening parts 11 which are penetrated such that one edge sides serve as inlets 11a of a washing liquid and the other edge sides serve as outlets 11b of the washing liquid, wherein a plurality of substrates 200 are attached to the inner surface of the opening parts 11 so as to have a gap between the substrates and be arranged along the direction vertical to plate surface of the substrate, in such a substrate attachment state, the washing liquid is introduced from the inlets 11a, is caused to pass through the interior of the opening parts 11 and is made effluent from the outlets 11b and the plurality of substrates 200 are washed. Therein, baffle plates 20 are disposed on positions each of which forms a gap between adjoining substrates 200 among the opening parts 11 and, in such a substrate attachment state, the washing liquid is caused to pass through the gaps between the plate material 20 and the substrate 200 in the opening parts 11. COPYRIGHT: (C)2011,JPO&INPIT