LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To improve a cooling system for cooling an optical component having an optical component as a part to be cooled. SOLUTION: A lithographic apparatus is configured to transfer a pattern from a patterning device to a substrate. The lithographic apparatus includes a cooling system...

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Bibliographische Detailangaben
Hauptverfasser:	LAMBERTUS DONDERS SJOERD NICOLAAS, REMIE MARINUS JAN, VAN EIJK JAN, JACOBS JOHANNES HENRICUS WILHELMUS, ZAAL KOEN JACOBUS J M, KATE NICOLAAS TEN, VERMEULEN JOHANNES PETRUS MARTINUS
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve a cooling system for cooling an optical component having an optical component as a part to be cooled. SOLUTION: A lithographic apparatus is configured to transfer a pattern from a patterning device to a substrate. The lithographic apparatus includes a cooling system including a droplet ejector for cooling parts of the lithographic apparatus, forming droplets that are injected to cooling surfaces of the parts of the lithographic apparatus, and cooling the parts through evaporation of the droplets. COPYRIGHT: (C)2011,JPO&INPIT