METHOD FOR FORMING OXIDE

PROBLEM TO BE SOLVED: To provide a method of forming an oxide on a substrate. SOLUTION: In the method, first, a substrate is placed inside a chamber. Next, the chamber is fed with an oxygen-containing gas and a hydrogen-containing gas. The oxygen-containing gas and the hydrogen-containing gas are th...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KNOOT PETER A, MINER GARY E, GRONET CHRISTIAN M, XING GUANGCAI, LOPES DAVID R, KUPPURAO SATHEESH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOUNDS THEREOF ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of forming an oxide on a substrate. SOLUTION: In the method, first, a substrate is placed inside a chamber. Next, the chamber is fed with an oxygen-containing gas and a hydrogen-containing gas. The oxygen-containing gas and the hydrogen-containing gas are then reacted with each other, and water vapor is formed within the chamber. Then, water vapor oxidizes the substrate. COPYRIGHT: (C)2011,JPO&INPIT