TRANSPARENT BASE WITH TRANSPARENT CONDUCTIVE FILM, METHOD OF MANUFACTURING SAME, AND PHOTOELECTRIC CONVERTER COMPRISING SUCH BASE

PROBLEM TO BE SOLVED: To provide a transparent substrate with a transparent conductive film that is thin but that has a surface with ruggedness with large height. SOLUTION: A transparent substrate with a transparent conductive film includes a transparent substrate, and a transparent conductive film...

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Bibliographische Detailangaben
Hauptverfasser:	FUJISAWA AKIRA, SUEYOSHI YUKIO, SETO YASUNARI, YOSHIDA HIDEMASA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY INSULATORS JOINING GLASS TO GLASS OR OTHER MATERIALS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a transparent substrate with a transparent conductive film that is thin but that has a surface with ruggedness with large height. SOLUTION: A transparent substrate with a transparent conductive film includes a transparent substrate, and a transparent conductive film that is formed on the transparent substrate and that contains crystalline metal oxide as its main component, wherein the transparent conductive film has a thickness range of 300 to 750 nm, and the transparent substrate with a transparent conductive film has a haze ratio of at least 15%; and with respect to peak areas, corresponding to orientation planes of the crystalline oxide calculated from an X-ray diffraction pattern, when the peak area of a (110) plane is set at 100, all the orientation planes other than the plane have each a peak area that os 80 or smaller. COPYRIGHT: (C)2011,JPO&INPIT