ELECTRON BEAM DEVICE HAVING LINE ANALYSIS FUNCTION

PROBLEM TO BE SOLVED: To provide a method capable of easily setting analysis points at arbitrary intervals and arbitrary points on the same line segment when performing line analysis by irradiating an electron beam to a sample. SOLUTION: A line analysis position on an HAADF image is specified by usi...

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Bibliographische Detailangaben
Hauptverfasser: ISHIKAWA TAKAKI, INAMI WATARU, YASUHARA SATOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method capable of easily setting analysis points at arbitrary intervals and arbitrary points on the same line segment when performing line analysis by irradiating an electron beam to a sample. SOLUTION: A line analysis position on an HAADF image is specified by using a pointing device such as a mouse. For example, a starting point P1 and a finished point P6 of the line analysis are specified so as to become a right angle to a crystal grain boundary, and the number of analysis points (sample) 6 are specified with a key board. For example, X-ray intensity of an attention element on a line segment orthogonal to the grain boundary is measured by an X-ray detector 13, and the analysis results are displayed with a graph. Analysis points S1 to S6 which are further subdivided rather than a preset interval are automatically specified on a line centralizing attention points with high X-ray intensity. COPYRIGHT: (C)2011,JPO&INPIT