GRINDING DEVICE

PROBLEM TO BE SOLVED: To store a workpiece after cleaning in a recovery cassette in a clean state without contamination. SOLUTION: When a ground wafer 1 is cleaned with a cleaning apparatus 70, a movable cover 76 is lowered to a shelter position and the wafer 1 is delivered from a chuck table 30 to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SATO KICHIZO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To store a workpiece after cleaning in a recovery cassette in a clean state without contamination. SOLUTION: When a ground wafer 1 is cleaned with a cleaning apparatus 70, a movable cover 76 is lowered to a shelter position and the wafer 1 is delivered from a chuck table 30 to a spinner table 71 of the cleaning apparatus 70 by a recovery means 60. Subsequently, the movable cover 76 is raised to an operation position, and then the wafer 1 is cleaned by spinning the spinner table 71 while supplying cleaning water. Then, after blocking a space between the cleaning apparatus 70 and a turntable 17 by a shutter 80 by raising the shutter 80 to the operation position, the movable cover 76 is opened, and the wafer 1 is delivered and stored from the spinner table 71 to the recovery cassette 14B by a robot 15. The contamination of the wafer 1 is prevented by blocking the spraying of grinding water or the like from the treatment position to the wafer 1 on the spinner table 71 by the shutter 80. COPYRIGHT: (C)2011,JPO&INPIT