PROXIMITY EXPOSURE DEVICE, GAP CONTROL METHOD OF PROXIMITY EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE

PROBLEM TO BE SOLVED: To prevent a mask and a substrate from coming into contact with each other when moving the substrate stepwise in an XY direction, and to adjust a gap between the mask and the substrate in a short time after moving the substrate stepwise in the XY direction. SOLUTION: With respe...

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Bibliographische Detailangaben
Hauptverfasser: TOIKAWA HIROSHI, MINEGISHI MANABU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent a mask and a substrate from coming into contact with each other when moving the substrate stepwise in an XY direction, and to adjust a gap between the mask and the substrate in a short time after moving the substrate stepwise in the XY direction. SOLUTION: With respect to one substrate, positions in a Z direction of respective Z-tilt mechanisms after gap adjustment (or positions at a first prescribed distance from these positions) are stored as registered positions for respective shots of the Z-tilt mechanisms per shot. With respect to a plurality of following substrates, in the first shot, gap adjustment is performed after the Z-tilt mechanisms are moved to positions at the first prescribed distance from registered positions for the first shot to the Z direction (or to the registered positions). In the second and following steps, gaps between masks and the substrates are widened by a second prescribed distance shorter than the first prescribed distance before stepwise movement in the XY direction of the substrates, and gap adjustment is performed after stepwise movement in the XY direction of the substrates. COPYRIGHT: (C)2011,JPO&INPIT