HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD

PROBLEM TO BE SOLVED: To provide a heat treatment apparatus and a heat treatment method capable of measuring an intensity waveform of light radiated from a substrate at light irradiation and detecting an abnormality in treatment. SOLUTION: A light radiated from a substrate having a temperature raise...

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1. Verfasser:	KUROIWA TORU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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