HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD

PROBLEM TO BE SOLVED: To provide a heat treatment apparatus and a heat treatment method capable of measuring an intensity waveform of light radiated from a substrate at light irradiation and detecting an abnormality in treatment. SOLUTION: A light radiated from a substrate having a temperature raised by light irradiation from a flash lamp is made incident through a quartz probe 18, and guided into a waveform measurement section 20 equipped with a photodiode 21. The waveform measurement section 20 measures and obtains a time waveform of the intensity of light incident into the quartz probe 18, and transfers the obtianed light to a waveform storage section 35 of a main controller 3. The waveform storage section 35 stores a reference waveform as a time waveform of the intensity of radiated light when light irradiation is normally executed and a treatment waveform as a time waveform as the intensity of radiated light when the substrate to be treated is radiated with light. An abnormality detecting section 37 detects an abnormality of light irradiation heat treatment by comparing a reference waveform with the treatment waveform. COPYRIGHT: (C)2011,JPO&INPIT