METHOD FOR NORMALIZING STRAIN IN SEMICONDUCTOR DEVICE, AND STRAIN-NORMALIZED SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a method for normalizing strain in a semiconductor device, and a strain-normalized semiconductor device. SOLUTION: This method includes steps of: forming first and second field-effect transistors of an integrated circuit; forming a stress layer over the first and sec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ELLIS-MONAGHAN JOHN JOSEPH, HABIB NAZMUL, KERRY BERNSTEIN, BRUCE BALCH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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