SUBSTRATE PROCESSING APPARATUS
PROBLEM TO BE SOLVED: To prevent or suppress entry of the atmosphere in a substrate conveyance space into a substrate storage container. SOLUTION: An indexer space and an external space are formed with a partition 7. On the partition 7, a passage hole 8 opposed to the substrate entrance/exit port 10...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To prevent or suppress entry of the atmosphere in a substrate conveyance space into a substrate storage container. SOLUTION: An indexer space and an external space are formed with a partition 7. On the partition 7, a passage hole 8 opposed to the substrate entrance/exit port 10 of the substrate storage container C mounted on a storage container mounting table 6 is formed. On the opposite side of the storage container mounting table 6 from the passage hole 8, a cover 20 in a nearly box shape is provided which covers the entire area of the passage hole 8. A laterally long opening 28 where a hand 15 passes through when the substrate W is taken in and out of the substrate container C is formed in the opposite wall 21 of the cover 20. The width of the opening 28 in the height direction is set to be about twice as large as stacking intervals N of substrates W in the substrate storage container C. A cover elevating and lowering drive mechanism for elevating and lowering the cover 20 is coupled to a support member for supporting the cover 20. COPYRIGHT: (C)2011,JPO&INPIT |
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