FILM FOR VAPOR DEPOSITION FILM AND GAS BARRIER FILM

PROBLEM TO BE SOLVED: To provide a film for vapor deposition that has a well-balanced combination of adhesion properties and gas barrier properties. SOLUTION: The film for vapor deposition has an anchor coat layer formed from a urethane resin formed on at least one side of a film formed from a therm...

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Bibliographische Detailangaben
Hauptverfasser: MOGI MASASHI, SAKAMOTO SAORI, KIMURA MASAHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film for vapor deposition that has a well-balanced combination of adhesion properties and gas barrier properties. SOLUTION: The film for vapor deposition has an anchor coat layer formed from a urethane resin formed on at least one side of a film formed from a thermoplastic resin. In the film, the polyurethane resin is a polyurethane dispersion prepared by dispersing in water an aqueous polyurethane resin produced by reacting an isocyanate group-terminated urethane prepolymer with a chain extender and the isocyanate group-terminated urethane prepolymer includes an adhesive urethane prepolymer for imparting adhesion properties and a gas-barrier urethane prepolymer for imparting gas barrier properties. COPYRIGHT: (C)2011,JPO&INPIT