FILM-FORMING METHOD AND LIPOPHOBIC SUBSTRATE

PROBLEM TO BE SOLVED: To provide a film-forming method which can produce a lipophobic substrate provided with a lipophobic film thereon having practicable abrasion resistance. SOLUTION: The film-forming method includes: firstly forming the first film 103 which has a hardness higher than a substrate...

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Bibliographische Detailangaben
Hauptverfasser: SUGAWARA TAKUYA, SHIONO ICHIRO, NAGAE EKISHU, KYO YUSHO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film-forming method which can produce a lipophobic substrate provided with a lipophobic film thereon having practicable abrasion resistance. SOLUTION: The film-forming method includes: firstly forming the first film 103 which has a hardness higher than a substrate 101 and has a predetermined thickness or more, on the surface of the substrate 101 with a dry film-forming method (excluding an ion-assisted vapor deposition method), in the first film-forming step; next, irradiating the formed first film 103 with particles having such specific energy that an accelerating voltage is a predetermined value or higher and the current density is a predetermined value or lower, thereby to form appropriate asperities on the surface of the first film 103, in the first irradiation step; and furthermore, forming the lipophobic film 105 on the asperity surface of the first film 103, in the second film-forming step. COPYRIGHT: (C)2011,JPO&INPIT