STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD

PROBLEM TO BE SOLVED: To provide a stamper for imprint which can suppress peeling of a resist film by use of the stamper for imprint having electrical conductivity, to provide a method for manufacturing the same, and to provide an imprint method. SOLUTION: The surface resistance of this stamper for...

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description PROBLEM TO BE SOLVED: To provide a stamper for imprint which can suppress peeling of a resist film by use of the stamper for imprint having electrical conductivity, to provide a method for manufacturing the same, and to provide an imprint method. SOLUTION: The surface resistance of this stamper for imprint is 1-1,000 Ω/cm2. This imprint method includes: a press-contacting step of press-contacting the stamper for imprint to a layer for shape transfer formed on a substrate; an energization step of energizing to the stamper for imprint; and a separation step of separating the stamper for imprint from the shape transfer layer. The method for manufacturing the stamper includes a step of forming a conductive film on a surface of an uneven pattern of a quartzose substrate having the uneven pattern by the physical vapor deposition method. COPYRIGHT: (C)2010,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2010219446A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2010219446A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2010219446A3</originalsourceid><addsrcrecordid>eNrjZPAKDnH0DXANUnDzD1Lw9A0I8vQL0VHwdQ3x8HcBi_k6-oW6OTqHhAJl3BVCPFwVgh19XXUUHP1cYOqhynkYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBoYGRoaWJiZmjMVGKAKDJLZc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD</title><source>esp@cenet</source><creator>YASUDA YOSHITOMO</creator><creatorcontrib>YASUDA YOSHITOMO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a stamper for imprint which can suppress peeling of a resist film by use of the stamper for imprint having electrical conductivity, to provide a method for manufacturing the same, and to provide an imprint method. SOLUTION: The surface resistance of this stamper for imprint is 1-1,000 Ω/cm2. This imprint method includes: a press-contacting step of press-contacting the stamper for imprint to a layer for shape transfer formed on a substrate; an energization step of energizing to the stamper for imprint; and a separation step of separating the stamper for imprint from the shape transfer layer. The method for manufacturing the stamper includes a step of forming a conductive film on a surface of an uneven pattern of a quartzose substrate having the uneven pattern by the physical vapor deposition method. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><language>eng</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2010219446A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2010219446A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YASUDA YOSHITOMO</creatorcontrib><title>STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD</title><description>PROBLEM TO BE SOLVED: To provide a stamper for imprint which can suppress peeling of a resist film by use of the stamper for imprint having electrical conductivity, to provide a method for manufacturing the same, and to provide an imprint method. SOLUTION: The surface resistance of this stamper for imprint is 1-1,000 Ω/cm2. This imprint method includes: a press-contacting step of press-contacting the stamper for imprint to a layer for shape transfer formed on a substrate; an energization step of energizing to the stamper for imprint; and a separation step of separating the stamper for imprint from the shape transfer layer. The method for manufacturing the stamper includes a step of forming a conductive film on a surface of an uneven pattern of a quartzose substrate having the uneven pattern by the physical vapor deposition method. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAKDnH0DXANUnDzD1Lw9A0I8vQL0VHwdQ3x8HcBi_k6-oW6OTqHhAJl3BVCPFwVgh19XXUUHP1cYOqhynkYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBoYGRoaWJiZmjMVGKAKDJLZc</recordid><startdate>20100930</startdate><enddate>20100930</enddate><creator>YASUDA YOSHITOMO</creator><scope>EVB</scope></search><sort><creationdate>20100930</creationdate><title>STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD</title><author>YASUDA YOSHITOMO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2010219446A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>YASUDA YOSHITOMO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YASUDA YOSHITOMO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD</title><date>2010-09-30</date><risdate>2010</risdate><abstract>PROBLEM TO BE SOLVED: To provide a stamper for imprint which can suppress peeling of a resist film by use of the stamper for imprint having electrical conductivity, to provide a method for manufacturing the same, and to provide an imprint method. SOLUTION: The surface resistance of this stamper for imprint is 1-1,000 Ω/cm2. This imprint method includes: a press-contacting step of press-contacting the stamper for imprint to a layer for shape transfer formed on a substrate; an energization step of energizing to the stamper for imprint; and a separation step of separating the stamper for imprint from the shape transfer layer. The method for manufacturing the stamper includes a step of forming a conductive film on a surface of an uneven pattern of a quartzose substrate having the uneven pattern by the physical vapor deposition method. COPYRIGHT: (C)2010,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
title STAMPER FOR IMPRINT, METHOD FOR MANUFACTURING THE SAME, AND IMPRINT METHOD
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