VAPOR GROWTH APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR

PROBLEM TO BE SOLVED: To provide a vapor growth apparatus of a group III nitride semiconductor which can prevent a crack of a substrate even in a case of vapor growth of a substrate with a diameter of three inches or larger. SOLUTION: The vapor growth apparatus of a face down type group III nitride...

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Hauptverfasser: TAKAHASHI YUZURU, ISO KENJI, ISHIHAMA YOSHIYASU, TAKAGI RYOHEI
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creator TAKAHASHI YUZURU
ISO KENJI
ISHIHAMA YOSHIYASU
TAKAGI RYOHEI
description PROBLEM TO BE SOLVED: To provide a vapor growth apparatus of a group III nitride semiconductor which can prevent a crack of a substrate even in a case of vapor growth of a substrate with a diameter of three inches or larger. SOLUTION: The vapor growth apparatus of a face down type group III nitride semiconductor includes a susceptor for holding the substrate with a down-turned crystal growth surface, an opposite face of the susceptor, a heater for heating the substrate, a material gas introducing part arranged in a center part of the susceptor, a reaction furnace formed of a gap between the susceptor and the opposite face of the susceptor, and a reaction gas discharge part arranged on an outer circumference side of the susceptor. The susceptor 2 includes four or more claws 10 for one substrate holder 8. COPYRIGHT: (C)2010,JPO&INPIT
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title VAPOR GROWTH APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
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