COATING/DEVELOPING DEVICE, COATING/DEVELOPING METHOD AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To prevent contamination of particles of a substrate in a coating/developing device for continuously forming a resist pattern on the substrate for a plurality of times. SOLUTION: The coating/developing device includes a control part controlling operations of a substrate transfer means and respective modules so that a step of performing a water repellent processing on a side part of the substrate by a water repellent module or a step of performing first resist coating on a whole face by a coating module is performed, and a step of performing a first phenomenon by a developing module after first liquid immersion exposure is performed by an exposure device, a step of performing second resist coating on the whole face by the coating module and a step of performing a second phenomenon by the developing module after second liquid immersion exposure is performed by the exposure device are performed, and with a substrate side water repellent module for performing the water repellent processing on a side part of the substrate while second liquid immersion exposure is performed after termination of first development. COPYRIGHT: (C)2010,JPO&INPIT