EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the ho...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KATO MASANORI, SAKO NAOYA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator KATO MASANORI
SAKO NAOYA
description PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the holding table; a detecting device detecting the surface position of the substrate mounted on an outer rim region of the mount extended from the support along the mounting face of the mount; a driving device driving the stage device on the basis of the detection results of the detecting device; and an irradiating device irradiating the substrate moved by the stage device with exposure light. COPYRIGHT: (C)2010,JPO&INPIT
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2010217389A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2010217389A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2010217389A3</originalsourceid><addsrcrecordid>eNrjZPBwjQjwDw4NclVwDAhwDHIMCQ3WUYCL-bqGePi76Cg4-rlA2Qpu_kEKvo5-oW6OziGhQZ5-7gourmGezq48DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTeK8DIwNDAyNDc2MLS0ZgoRQByty1k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE</title><source>esp@cenet</source><creator>KATO MASANORI ; SAKO NAOYA</creator><creatorcontrib>KATO MASANORI ; SAKO NAOYA</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the holding table; a detecting device detecting the surface position of the substrate mounted on an outer rim region of the mount extended from the support along the mounting face of the mount; a driving device driving the stage device on the basis of the detection results of the detecting device; and an irradiating device irradiating the substrate moved by the stage device with exposure light. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2010217389A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100930&amp;DB=EPODOC&amp;CC=JP&amp;NR=2010217389A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KATO MASANORI</creatorcontrib><creatorcontrib>SAKO NAOYA</creatorcontrib><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE</title><description>PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the holding table; a detecting device detecting the surface position of the substrate mounted on an outer rim region of the mount extended from the support along the mounting face of the mount; a driving device driving the stage device on the basis of the detection results of the detecting device; and an irradiating device irradiating the substrate moved by the stage device with exposure light. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPBwjQjwDw4NclVwDAhwDHIMCQ3WUYCL-bqGePi76Cg4-rlA2Qpu_kEKvo5-oW6OziGhQZ5-7gourmGezq48DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTeK8DIwNDAyNDc2MLS0ZgoRQByty1k</recordid><startdate>20100930</startdate><enddate>20100930</enddate><creator>KATO MASANORI</creator><creator>SAKO NAOYA</creator><scope>EVB</scope></search><sort><creationdate>20100930</creationdate><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE</title><author>KATO MASANORI ; SAKO NAOYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2010217389A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KATO MASANORI</creatorcontrib><creatorcontrib>SAKO NAOYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KATO MASANORI</au><au>SAKO NAOYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE</title><date>2010-09-30</date><risdate>2010</risdate><abstract>PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the holding table; a detecting device detecting the surface position of the substrate mounted on an outer rim region of the mount extended from the support along the mounting face of the mount; a driving device driving the stage device on the basis of the detection results of the detecting device; and an irradiating device irradiating the substrate moved by the stage device with exposure light. COPYRIGHT: (C)2010,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2010217389A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T08%3A13%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KATO%20MASANORI&rft.date=2010-09-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2010217389A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true