EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the ho...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KATO MASANORI, SAKO NAOYA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing generation of an exposure failure. SOLUTION: The exposure apparatus is equipped with: a stage device including a mount to mount a substrate, a holding table holding the mount, and a support supporting the mount with respect to the holding table; a detecting device detecting the surface position of the substrate mounted on an outer rim region of the mount extended from the support along the mounting face of the mount; a driving device driving the stage device on the basis of the detection results of the detecting device; and an irradiating device irradiating the substrate moved by the stage device with exposure light. COPYRIGHT: (C)2010,JPO&INPIT