ALUMINUM-CONTAINING PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide an inexpensive aluminum-containing photosensitive resin composition, from which a pattern with a low resistance value can be formed, and to provide a method for forming a pattern by using the photosensitive resin composition. SOLUTION: The aluminum-containing photose...

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Bibliographische Detailangaben
Hauptverfasser:	OKABE SHOGO, HIRANO TOSHISANE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an inexpensive aluminum-containing photosensitive resin composition, from which a pattern with a low resistance value can be formed, and to provide a method for forming a pattern by using the photosensitive resin composition. SOLUTION: The aluminum-containing photosensitive resin composition contains: (A) aluminum powder; (C) an alkali-soluble resin having 5 to 20 wt.% of structural units derived from (meth)acrylic acids, 25 to 95 wt.% of structural units derived from acrylates, and 0 to 70 wt.% of structural units derived from methacrylates; (D) a polyfunctional (meth)acrylate; and (E) a photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT