LITHOGRAPHIC APPARATUS, RADIATION BEAM INSPECTION DEVICE, METHOD OF INSPECTING BEAM OF RADIATION AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a system and a method which can determine an error introduced to a spot array by the array of a focusing element in a lithography apparatus. SOLUTION: The lithographic apparatus has a radiation beam inspection device including: a barrier to the beam of radiation, the...

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1. Verfasser:	VENEMA WILLEM JURRIANUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system and a method which can determine an error introduced to a spot array by the array of a focusing element in a lithography apparatus. SOLUTION: The lithographic apparatus has a radiation beam inspection device including: a barrier to the beam of radiation, the barrier having an aperture through which a portion of the beam of radiation passes; and a radiation sensor that determines the intensity of the radiation passing through the aperture and the position, relative to the aperture, of the point at which the radiation is incident on the radiation sensor. COPYRIGHT: (C)2010,JPO&INPIT