AMORPHOUS CARBON COVERED MEMBER

AMORPHOUS CARBON COVERED MEMBER

PROBLEM TO BE SOLVED: To provide machine parts, cutting tools and molds used under extremely high contact pressures, in which an amorphous carbon film is provided which has a sufficient adhesion to them. SOLUTION: The amorphous carbon covered member has an interlayer 2 comprising at least one elemen...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: UCHIUMI YOSHIHARU, ODA KAZUHIKO
Format: Patent
Sprache:eng
Schlagworte:
BORING
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MACHINE TOOLS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
PERFORMING OPERATIONS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
TURNING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide machine parts, cutting tools and molds used under extremely high contact pressures, in which an amorphous carbon film is provided which has a sufficient adhesion to them. SOLUTION: The amorphous carbon covered member has an interlayer 2 comprising at least one element selected from the group consisting of elements in the IVa, Va, VIa and IIIb groups and the IVb group except C in the periodic table, or a carbide of at least one element selected from the group on a base material 1, and an amorphous carbon film 3 formed on the interlayer 2. The interlayer 2 has a thickness of 0.5 nm or over and less than 10 nm. COPYRIGHT: (C)2010,JPO&INPIT