RESIST MATERIAL AND METHOD FOR FORMING PATTERN USING THE SAME

PROBLEM TO BE SOLVED: To provide a method for forming a pattern having a good feature while decreasing roughness generating in a resist pattern. SOLUTION: A resist film 102 is formed on a substrate 101, and the formed resist film 102 is subjected to pattern exposure by selectively irradiating with e...

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Bibliographische Detailangaben

Hauptverfasser:	ENDO MASATAKA, SASAKO MASARU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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