PROXIMITY-SCANNING EXPOSURE DEVICE AND PROXIMITY-SCANNING EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide a proximity-scanning exposure device and a proximity-scanning exposure method for preventing the occurrence of connection unevenness in adjacent exposed regions, when using a plurality of masks to be exposed in proximity. SOLUTION: The proximity-scanning exposure dev...

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Bibliographische Detailangaben
Hauptverfasser:	MATSUZAKA MASAAKI, KAWASHIMA HIRONORI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a proximity-scanning exposure device and a proximity-scanning exposure method for preventing the occurrence of connection unevenness in adjacent exposed regions, when using a plurality of masks to be exposed in proximity. SOLUTION: The proximity-scanning exposure device 1 includes a radiating light EL for exposure via the plurality of the masks M with respect to conveyed substrates W; exposing patterns of each mask M on the substrates W; and forming a plurality of exposed regions which are arranged in a direction orthogonal to a conveying direction. The exposure device 1 includes a gap change means for changing at least one of each gap between each mask which expose the adjacent exposed regions in an orthogonal direction and the substrate, in real time. COPYRIGHT: (C)2010,JPO&INPIT