PATTERN LAYOUT CREATION METHOD

PROBLEM TO BE SOLVED: To provide a pattern layout creation method for dividing a pattern layout diagram into two parts so as to form patterns with high precision. SOLUTION: The pattern layout creation method includes: a graph generation process (S2) for generating a graph in which patterns generated...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAIRI MASAHIRO, MAEDA YUKITO, INOUE SOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pattern layout creation method for dividing a pattern layout diagram into two parts so as to form patterns with high precision. SOLUTION: The pattern layout creation method includes: a graph generation process (S2) for generating a graph in which patterns generated bassed on a pattern layout diagram are each regarded as nodes and nodes of patterns adjacent to each other at a first distance are connected with each other by an edge; a classification process (S3) for classifying each of the patterns into two types; and a classification result correction process (S5-S14) for correcting a classification result by grouping the patterns in each node cluster connected by the edge, and by inverting each of types of a pattern belonging to a same group as that of one pattern, out of a pair of patterns that are classified into a same type and that belong to respectively different groups adjacent to each other at a second distance. The pattern layout diagram is divided based on the classification result corrected in the classification result correction process. COPYRIGHT: (C)2010,JPO&INPIT