METHOD FOR DEPOSITING THIN FILM

PROBLEM TO BE SOLVED: To provide a method for depositing a thin film capable of performing film-deposition by highly efficiently generating stable plasma. SOLUTION: In the method for depositing the thin film, a thin film depositing device including a vacuum vessel 11 maintaining the inner part there...

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Bibliographische Detailangaben
Hauptverfasser: SAKURAI TAKESHI, AMANO NAOJI, CHIBA KOKI, KYO YUSHO, SONG YIZHOU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for depositing a thin film capable of performing film-deposition by highly efficiently generating stable plasma. SOLUTION: In the method for depositing the thin film, a thin film depositing device including a vacuum vessel 11 maintaining the inner part thereof in a vacuum and a plasma generating means generating plasma in an antenna housing room 80A connected to the vacuum vessel is used. The method for manufacturing the thin film includes: a pressure reducing step for evacuating the inner part of the vacuum vessel in a vacuum state and reducing pressure of the inner part of the antenna housing room in a vacuum state of 10-3Pa or lower to be lower than that of the vacuum vessel; and a plasma treatment step for generating plasma in the inner part of the vacuum vessel by applying a high frequency voltage to an antenna 85a and subjecting the thin film formed in the vacuum vessel to plasma treatment. COPYRIGHT: (C)2010,JPO&INPIT