APPARATUS AND METHOD FOR DETERMINISTIC CONTROL OF SURFACE CONFIGURATION DURING FULL APERTURE POLISHING

PROBLEM TO BE SOLVED: To provide apparatus and method for creating a deterministic polishing process with respect to an optical surface. SOLUTION: The computerized method for calculating the amount of material removed from a workpiece during the polishing process in a polishing system includes recei...

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Hauptverfasser:	SURATWALA TAYYAB ISHAQ, FEIT MICHAEL DENNIS, STEELE WILLIAM AUGUSTUS
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide apparatus and method for creating a deterministic polishing process with respect to an optical surface. SOLUTION: The computerized method for calculating the amount of material removed from a workpiece during the polishing process in a polishing system includes receiving a pair of polishing characteristics; calculating a pair of kinematic characteristics with respect to a lap and the workpiece; calculating an exposure time with respect to a couple of lap points; calculating friction force between the lap and the workpiece; calculating inclination between the lap and the workpiece; calculating pressure distribution between the lap and the workpiece; calculating cumulative pressure distribution between the lap and the workpice; and calculating the amount of material removed from the workpiece. COPYRIGHT: (C)2010,JPO&INPIT