IMPRINTING METHOD

PROBLEM TO BE SOLVED: To provide an imprinting method preventing separation of a resist film over a further long term, in an imprinting method of transferring and forming a minute pattern to/on a shape transferring object layer using a stamper having an irregular pattern. SOLUTION: The imprinting me...

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Bibliographische Detailangaben
Hauptverfasser:	IKUI NORITO, YASUDA YOSHITOMO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an imprinting method preventing separation of a resist film over a further long term, in an imprinting method of transferring and forming a minute pattern to/on a shape transferring object layer using a stamper having an irregular pattern. SOLUTION: The imprinting method includes: a pattern formation step of transferring and forming a minute pattern 31 to/on the shape transferring object layer 30 formed on a substrate with a stamper 10 having an uneven pattern 11; and a curing step of curing the layer 30' with the minute pattern 31 transferred and formed thereon. The stamper 10 is formed of a porous material. The imprinting method includes a parting agent attaching step of attaching a liquid-like parting agent 20 to the stamper 10 before the pattern formation process. COPYRIGHT: (C)2010,JPO&INPIT