TEMPLATE FOR PATTERNING MEDIA, AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To obtain a template for patterning media fulfilling good uniformity, severe precision requisite and the possibility of low cost, and a template manufacturing method. SOLUTION: A resist pattern is formed on a first material layer and an isotropic layer of a second material is deposited on the resist pattern to cover the upper part and side wall of a resist structure. A first material has higher resistance against ion milling than the second material and has lower resistance in plasma etching than the second material. Amorphous carbon is preferable as the first material and aluminum oxide is preferable as the second material. The second material is removed from the upper part of the resist structure to be left on the side wall thereof. The resist structure and the part of the first layer not supporting the second material are removed by plasma. The left structure has high density twice that of the resist pattern. If the isotropic deposition and ion milling of the second material are repeated, a pattern structure having a high density pitch four times that of the pattern structure formed from the second material can be also obtained. COPYRIGHT: (C)2010,JPO&INPIT