APPARATUS AND METHOD OF REMOVING MOISTURE IN GAS

PROBLEM TO BE SOLVED: To provide a method of removing moisture from a gas, wherein (1) the moisture is removed while executing the control of a moisture rate in a target space without using heat energy, (2) a water molecule in a gas state has latent heat energy and is recovered as sensible heat ener...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MANABE SEIICHI, YASUDA ZENICHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of removing moisture from a gas, wherein (1) the moisture is removed while executing the control of a moisture rate in a target space without using heat energy, (2) a water molecule in a gas state has latent heat energy and is recovered as sensible heat energy, (3) limitation by a moisture rate in the atmosphere is mitigated for a moisture removing speed and a reachable zone of the moisture rate after removal, and (4) application is performed even in a place where a space part to remove the moisture is not adjacent to the atmosphere. SOLUTION: The apparatus of removing the moisture from a gas which is wet by high humidity comprises a double cylinder provided with a circuit for making a wet high-temperature gas (gas A) flow inside a cylindrical porous flat membrane module and a circuit for making the gas (gas B) of absolute humidity lower than that of the gas flow formed on the outer side of the cylindrical flat membrane, the porous flat membrane comprises at least two hydrophilic polymer materials, and a moisture flat membrane transmission mechanism is the center of the contribution of diffusion in the method of removing the moisture. COPYRIGHT: (C)2010,JPO&INPIT