DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD

DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD

PROBLEM TO BE SOLVED: To improve a defect inspection in detection sensitivity for a minute defect while suppressing generation of pseudo defects. SOLUTION: A defect inspecting apparatus 1 is provided which includes: a gray level determining means 15 for determining a gray level difference of corresp...

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Bibliographische Detailangaben
1. Verfasser: KAMIYAMA SHINJI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve a defect inspection in detection sensitivity for a minute defect while suppressing generation of pseudo defects. SOLUTION: A defect inspecting apparatus 1 is provided which includes: a gray level determining means 15 for determining a gray level difference of corresponding pixels between an image to be inspected and a reference image; and a defect determining means 16 for determining whether or not an inspection object pixel is a defect candidate by using a pattern recognition which carries out a classification in accordance with a value of a discriminant function whose feature values are respective gray level differences in the inspection object pixel and its adjacent pixel. COPYRIGHT: (C)2010,JPO&INPIT