ELECTRON GUN APPARATUS FOR ELECTRON BEAM VAPOR DEPOSITION

PROBLEM TO BE SOLVED: To provide an electron gun apparatus for electron beam vapor deposition which can easily perform a flattening operation for melt marks. SOLUTION: In the electron gun apparatus for electron beam vapor deposition composed in such a manner that an electron beam orbit is bent by a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YAMASHITA KENICHI, TAKASHIMA TOORU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an electron gun apparatus for electron beam vapor deposition which can easily perform a flattening operation for melt marks. SOLUTION: In the electron gun apparatus for electron beam vapor deposition composed in such a manner that an electron beam orbit is bent by a prescribed angle, it is emitted on a vapor deposition material 7 in a crucible 6, so as to melt the vapor deposition material 7, and the vapor of the vapor deposition material is deposited to the substrate to be vapor-deposited arranged at the upper part, so as to form a thin film, the apparatus is provided with: an electron beam orbit controlling means controlling an electron beam orbit by a deflecting coil 3 and an electron beam orbit by a scanning coil 5; and an incidence angle controlling means controlling the incidence angle of an electron beam 8 made incident on the vapor deposition material 7 by the electron beam orbit controlling means, and, by operating the electron beam orbit controlling means and the incidence angle controlling means, the melting degree of the vapor deposition material in the crucible 6 is equalized. COPYRIGHT: (C)2010,JPO&INPIT