METHOD FOR MANUFACTURING MAGNETIC HEAD

PROBLEM TO BE SOLVED: To provide a method for manufacturing a magnetic head which suppresses a variation in the core width of a main magnetic pole between wafers. SOLUTION: In the method for manufacturing the magnetic head by forming a hard mask on a magnetic material layer and forming the inverted-...

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Bibliographische Detailangaben
Hauptverfasser: FUJIEDA HIROSHI, INUKAI KAZUAKI, YAMAMOTO TAMOTSU, NAGANUMA YASUO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a magnetic head which suppresses a variation in the core width of a main magnetic pole between wafers. SOLUTION: In the method for manufacturing the magnetic head by forming a hard mask on a magnetic material layer and forming the inverted-trapezoidal main magnetic pole by ion milling which is irradiation with ion beams from an oblique direction, the width (the width of the bottom) W and the side wall inclination α of the hard mask before the ion milling are measured. Then, a beam irradiation angle θ when performing the ion milling of the magnetic material layer is determined according to the etching amount (shifting amount S) in the width direction of the hard mask and the side wall inclination α of the hard mask. The shifting amount S is obtained by subtracting the target value (design value) D of the core width of the main magnetic pole from the measured value of the width W of the hard mask. COPYRIGHT: (C)2010,JPO&INPIT