ABRASIVE CLOTH

PROBLEM TO BE SOLVED: To provide an abrasive cloth superior in smoothness which suppresses agglomeration of abrasive grains and grinding waste thereby performing grinding nearly free from a defect such as scratches. SOLUTION: In the abrasive cloth having a surface layer substantially made of only fi...

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Bibliographische Detailangaben
Hauptverfasser:	NONAKA SHUICHI, HASHIMOTO TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS PHYSICS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an abrasive cloth superior in smoothness which suppresses agglomeration of abrasive grains and grinding waste thereby performing grinding nearly free from a defect such as scratches. SOLUTION: In the abrasive cloth having a surface layer substantially made of only fiber, the number mean diameter is 1 to 500 nm and each of values of the mean deviation of surface roughness (SMD) in the longitudinal direction and the lateral direction is ≤2.0 μm. COPYRIGHT: (C)2010,JPO&INPIT