LINEAR DEPOSITION SOURCE

PROBLEM TO BE SOLVED: To provide a linear deposition source which correctly control the amount of the material evaporated from a plurality of crucibles fed to a plurality of nozzles. SOLUTION: The deposition source 100 comprises: (a) a plurality of crucibles 102 for containing deposition material; (...

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Bibliographische Detailangaben
Hauptverfasser:	CONROY CHAD, DAHLSTROM JACOB A, PRIDDY SCOTT WAYNE, BRESNAHAN RICH, GOTTHOLD DAVID WILLIAM, PATRIN JOHN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a linear deposition source which correctly control the amount of the material evaporated from a plurality of crucibles fed to a plurality of nozzles. SOLUTION: The deposition source 100 comprises: (a) a plurality of crucibles 102 for containing deposition material; (b) a body 112 comprising a plurality of conductance channels; (c) a heater that is positioned in thermal communication with the plurality of crucibles and the plurality conductance channels; (d) a heat shield that provides at least partial thermal isolation for at least one of the plurality of crucibles; and (e) a plurality of nozzles, an input of each of the plurality of nozzles being coupled to an output of one of the plurality of conductance channels, evaporated deposition materials being transported from the plurality of crucibles through the plurality of conductance channels to the plurality of nozzles wherein the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux. COPYRIGHT: (C)2010,JPO&INPIT