TREATMENT DEVICE FOR TREATING OBJECT

PROBLEM TO BE SOLVED: To provide a treatment device for treating a treatment object in a treatment vessel while rotating the treatment object. SOLUTION: A substrate treatment device 10 includes: a treatment vessel 100 for treating a substrate G in its inside using a treatment source 155; a plurality...

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Bibliographische Detailangaben
Hauptverfasser: TOBE YASUHIRO, HAYASHI TERUYUKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a treatment device for treating a treatment object in a treatment vessel while rotating the treatment object. SOLUTION: A substrate treatment device 10 includes: a treatment vessel 100 for treating a substrate G in its inside using a treatment source 155; a plurality of valves V installed on a wall part of the treatment vessel 100 for carrying the substrate G in the inside of the treatment vessel or carrying it out of the inside of the treatment vessel; a plurality of stages 110a, 110b arranged in point symmetry around a center axis O in the vertical direction with respect to the bottom face of the treatment vessel 100 and rotatable around the center axis O in the treatment vessel; and a stage support member 115 for supporting the plurality of stages 110a, 110b and rotating any other stage out of the plurality of stages 110a, 110b to the vicinity of any other valve V out of the plurality of valves V in accordance with timing for rotating any stage out of the plurality of stages 110a, 110b to the vicinity of a transport opening of any valve out of the plurality of valves. COPYRIGHT: (C)2010,JPO&INPIT