METHOD FOR MANUFACTURING PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND COATING DEVICE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask blank, suppressing a changes in thickness of a resist film, and also to provide a method for manufacturing a photomask, and a coating device. SOLUTION: In the method for manufacturing a photomask blank, a resist liquid 21 elevated by a coating means 2 that includes a liquid tank 20 and a coating nozzle 22 elevating the resist liquid 21 reserved in the liquid tank 20 by a capillary phenomenon, is brought into contact with the objective surface 10a to be coated of a substrate 10 facing downward, and the coating nozzle 22 and the substrate 10 are relatively moved to form a resist film 21 on the objective surface 10a of the substrate 10. The resist film is formed by the coating means 2 having at least a liquid surface area of the resist liquid 21 in the liquid tank 20, the liquid surface area necessary to control the change in thickness of the resist film to be within a tolerance, which is determined based on the relationship between a height reduction d of the surface of the resist liquid in the liquid tank 20, the height reduced by the consumption of the resist liquid 21 by application of the resist liquid 21 on the substrate 10, and the change in thickness of the resist film formed on the coated surface 10a of the substrate 10. COPYRIGHT: (C)2010,JPO&INPIT