RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR

PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, an acid generator formed of the compound, a resist composition containing the acid generator, and a method for forming a resist pattern using the resist composition. SOLUTION: The resist compositi...

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Bibliographische Detailangaben
Hauptverfasser:	HIDESAKA SHINICHI, UTSUMI YOSHIYUKI, KAWAKAMI AKINARI, MARUYAMA NATSUKO
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, an acid generator formed of the compound, a resist composition containing the acid generator, and a method for forming a resist pattern using the resist composition. SOLUTION: The resist composition contains a base component (A) which exhibits changed solubility in an alkali developer by the action of an acid and an acid generator component (B) which generates an acid upon exposure wherein the acid generator component (B) contains an acid generator (B1) formed of a compound having a group represented by a general formula (I) in a cation part, wherein R5is H or a 1-30C organic group which may have a substituent, and Q5is a single bond or a divalent linking group. COPYRIGHT: (C)2010,JPO&INPIT