CYCLIC COMPOUND COMPOSITION AND ITS PRODUCTION METHOD

PROBLEM TO BE SOLVED: To provide a photoresist material having high sensitivity and high resolution. SOLUTION: This composition contains one to four kinds of cyclic compounds represented by general formula (1) äwherein, mR1groups [(m) is one to four kinds of integers selected from 0 to 7] among 8R1g...

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Bibliographische Detailangaben
Hauptverfasser:	KUSABA TOSHIAKI, MIYAMOTO SHINJI, KASHIWAMURA TAKASHI, YOMOGIDA TOMOYUKI, OWADA TAKANORI, ISHII HIROTOSHI, SHIOYA HIDEAKI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photoresist material having high sensitivity and high resolution. SOLUTION: This composition contains one to four kinds of cyclic compounds represented by general formula (1) äwherein, mR1groups [(m) is one to four kinds of integers selected from 0 to 7] among 8R1groups are hydroxyl groups, and nR1groups [(n) is one to four kinds of integers selected from 8-(m)] are identical substituents except the hydroxyl group} in an amount of ≥90%. COPYRIGHT: (C)2010,JPO&INPIT