STEREOISOMER CYCLIC COMPOUND AND ITS PRODUCTION METHOD

PROBLEM TO BE SOLVED: To provide a material for photoresist substrates. SOLUTION: There is provided a compound represented by only one of formula (1) and formula (2) and having a purity of ≥90%. COPYRIGHT: (C)2010,JPO&INPIT

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Bibliographische Detailangaben
Hauptverfasser:	KASHIWAMURA TAKASHI, YOMOGIDA TOMOYUKI, OWADA TAKANORI, ISHII HIROTOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a material for photoresist substrates. SOLUTION: There is provided a compound represented by only one of formula (1) and formula (2) and having a purity of ≥90%. COPYRIGHT: (C)2010,JPO&INPIT