FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To deposit an MgO film with excellent (1 1 1) crystal orientation and excellent film density distribution. SOLUTION: Two gas ejection pipes 33a, 33b are provided on the side of a film deposition material chamber 23 from a conveying mechanism 29 in a film deposition chamber 22, on the outer side of an opening 28, and on a conveying path of a glass substrate 10 by the conveying mechanism 29 and on the upstream side from an end on the upstream side of the opening 28, and on the downstream side from an end on the downstream side, and the film deposition is performed on two ridge parts of the glass substrate 10 parallel to the conveying direction while blowing relatively more reactive gas to that for a center portion. As a result, the (1 1 1) crystal orientation intensity is improved, and the difference in the (1 1 1) crystal orientation intensity of the MgO film is reduced. Thus, the dispersion of the distribution is reduced, and the MgO film density distribution is also improved. COPYRIGHT: (C)2010,JPO&INPIT